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WCC800 Coating Equipment Sputter Deposition Process

The Huasheng WCC800 coating equipment adopts the DC+HiPIMS magnetron sputtering deposition process, capable of preparing various coatings such as WC and TiAlN with strong adhesion and stable, reliable performance. It features outstanding loading adaptability, accurately meeting the coating requirements for small-batch, multi-specification and special-shaped parts. With a modular structure design facilitating operation, maintenance and management, combined with a precise temperature and pressure control system, it ensures consistent coating quality. Equipped with high-quality core components and complete automation configuration, the equipment operates stably and efficiently, and is adaptable to diverse coating application scenarios.

Multi-purpose: General Coating Machine for Parts + Tools

Sputtering deposition, no film peeling.

Simple operation, adaptable to complex and diverse parts

    PVD Vacuum Coating Machine Features

    Ion Source
    • High-energy plasma for surface cleaning
    • Atomic-level etching without affecting roughness;
    • Easy maintenance
    Unbalanced magnetic field design for high target utilization;
    • Coating type: Cr、WC/C、TiAlN etc
    • Coating type: Cr, WC/C, TiAlN etc
    • Providing better coating quality
    • Lower film stress

    Vacuum Metalizing Equipment Parameters

    Model WCC800
    Technology 1DCMS+3HiPIMS
    Coating Type Cr、WC/C、TiAlN, etc
    Etching SET
    Number of Cathodes 4
    Dimension(LWH:mm) 3750 × 1800 × 2500
    Chamber Volume (m³) 0.8
    Coating Volume (mm) Φ650 × 400
    Loading Capacity(trees) 8/or per customer request
    Max Loading (KG) 350
    Spindle Diameter (mm) Φ170
    Process Time (h) 4~5

    WCC800 Equipment Layout

    WCC800 Equipment Layout

    Coating Performance and Applicationse

    Coating Performance and Applications-3

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    Coating Performance and Applications-4