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Etching Technology

Special designed magnetic field that surround the sample system evenly

Excellent homogeneity of etching

Good diffraction

Tunable etching strength

Etched modules are maintenance-free

Etching Technology (3)
Etching Technology (4)
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PVD Coating Technology

The Physical Vapor Deposition (PVD) technique refers to the process of vaporizing the surface of a material source (solid or liquid) into gaseous atoms or molecules, or partially ionizing into ions, using physical methods under vacuum conditions, and depositing a thin film with certain special functions on the substrate surface through a low-pressure gas (or plasma) process. PVD is one of the main surface treatment technologies.

Composite coating technology: Combines the advantages of arc and magnetron sputtering technologies in the same evaporation source:

Etching Technology (1)

Arc ion plating(AIP)

High ionization rate

High density

High deposition rate

Many microparticle

Rough surface

Etching Technology (2)

G4 integrated cathode

High ionization rate

High density

High deposition rate

Smooth surface, no microparticles

Low residual stress

Etching Technology (3)

Magnetron sputtering (MS)

Smooth surface, no microparticles

Low residual stress

Low deposition rate  

Low ionization rate 

PECVD Coating Technology

Plasma Enhanced Chemical Vapor Deposition (PECVD) is a process that deposits extremely smooth, adherent amorphous diamond hard alloy coatings in a highly vacuum environment. Compared to PVD processes, PECVD processes use deep plating power supplies, do not require cathode targets, and the workpiece does not need to rotate in the furnace chamber. This process is a clean, pollution-free, reliable, and multifunctional coating process.

● Simple hardware, no additional ionization source required

● Composite magnetic field design, increasing ionization rate

● High deposition speed>1μm/h

● Low deposition temperature <250℃

● Smooth surface, no large microparticle contamination

● Plasma cleaning products, maintenance-free

Etching Technology (4)

Simulation of non-equilibrium closed magnetic field

Etching Technology (5)

High-density plasma

Etching Technology (6)

Plasma cleaning products

PECVD(for a-C:H)

Based on the requirements for wear resistance, lubrication, corrosion resistance, and high bonding strength of parts, the DLC coating is structurally designed based on the concept of multi-layer structure, gradient transition, and interface composite.

Technology

DLC Coating structure

Etching Technology (7)

Thickness 2-4μm (depends on different requirement)