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OPT-S 800 – Magnetron Sputtering Optical Coating Equipment

OPT-S 800 is a magnetron sputtering optical coating machine with a Φ650 × H450 mm effective coating area and a Φ1150 × H980 mm chamber. It uses ion-source etching and 4 sputtering sources, with planar or cylindrical source options.
The OPT-S series covers optical lenses, automotive panels, display screens, LiDAR and head-up displays. Its listed film types include cut-off, band-pass and RGB filters, AR, hard AR, IR-AR, HR, AS/AF and ITO coatings.

    Coating1

    15 +

    Years Experience

    Installation1

    700 +

    Installations Worldwide

    Customized Solutions3

    OEM

    Solutions Available

    Innovation Driven1

    30 +

    Countries & Regions

    Key Benefits of OPT-S 800 Optical Coating Equipment

    4 Sputtering Sources

    OPT-S 800 is listed with 4 sputtering sources, with planar or cylindrical source options.

    Online Optical Monitoring

    The optical monitoring system provides real-time spectral monitoring and deposition endpoint control for multilayer films.

    Planetary Workpiece Motion

    Workpiece revolution and rotation support film-thickness distribution during optical multilayer deposition.

    Dense Optical Films

    The sputtering process supports dense, adherent films with low absorption and scattering losses.

    OPT-S 800 Features

    • Φ650 × H450 mm effective coating area
    • Φ1150 × H980 mm chamber
    • Φ135 × 10 shafts workpiece carrier specification
    opts800
    • 4 sputtering sources
    • 2 molecular pumps
    • Touch-screen and PLC control

    Product Parameter

    Model
    OPT-S 800
    Coating Technology
    Magnetron sputtering
    Etching Technology Ion-source etching
    Substrate Materials
    Glass, crystalline materials, polymers, ceramics and metals
    Equipment Structure
    Integrated vertical system; side-opening door; 2 viewing windows
    Chamber Size (Diameter × Height)
    Φ1150 × H980 mm
    Effective Coating Area (Diameter × Height)
    Φ650 × H450 mm
    Workpiece Carrier Specification
    Φ135 × 10 shafts; adjustable according to requirements
    Sputtering Sources 4; planar / cylindrical options
    Working Temperature
    Adjustable from room temperature to 300°C
    Ultimate Vacuum 8 × 10⁻⁵ Pa (no-load, clean-room condition)
    Process Gases
    Argon, nitrogen, oxygen and acetylene
    Equipment Dimensions (L × W × H) L3.8 × W1.8 × H2.3 m

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