OPT-E – Electron Beam Optical Coating Equipment
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Years Experience
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Installations Worldwide
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Electron Beam Evaporation Source
A high-power deflection electron gun and water-cooled copper crucible provide a focused evaporation source for high-melting-point metals and oxide ceramic materials.
Crystal and Optical Monitoring
Crystal and optical monitoring systems control film thickness and monitor optical wavelength during multilayer deposition.
Ion-Assisted Deposition
The listed ion-source configurations support film density and adhesion for optical thin films.
Multilayer Optical Films
Continuous multilayer deposition supports AR, HR and filter coatings for precision optical applications.
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Electron beam evaporation with a water-cooled copper crucible
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Glass, quartz, silicon wafer and ceramic substrate applications
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Crystal and optical monitoring
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RF, hollow cathode and filament Hall ion-source configurations
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Dome or planetary workpiece carriers
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Touch-screen and PLC control
Model |
OPT-E |
| Coating Technology | Electron beam evaporation |
| Working Principle | Physical vapour deposition using high-energy electron beam evaporation |
| Substrate Materials | Glass, quartz, silicon wafers and ceramics |
Typical Applications |
Mobile 3D glass, precision optical lenses and semiconductor wafers |
Coating Types |
AR, HR, optical filter films, semiconductor electrode/contact layers and AF films |
Common Coating Materials |
Silicon dioxide, titanium dioxide, zirconium dioxide and silicon monoxide |
Evaporation Source |
Deflection electron gun with a water-cooled copper crucible |
| Ultimate Vacuum | 6 × 10⁻⁴ Pa (no-load, clean-room condition) |
| Chamber Diameter Options | Φ900 / Φ1100 / Φ1350 / Φ1550 / Φ1800 / Φ2050 / Φ2350 / Φ2700 mm |
| Chamber Height | 1500 mm |
| Workpiece Carrier | Dome-shaped carrier / planetary flat disc |
| Carrier Specification | Integrated dome / 4-axis planetary disc |
Find answers about OPT-E optical coating equipment, including its coating process, applications and specifications.
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1. What is OPT-E optical coating equipment used for?
OPT-E is used for optical and functional film deposition on mobile 3D glass, precision optical lenses and semiconductor wafers.
2. Which coating types are listed for OPT-E?
The listed coatings include AR, HR and optical filter films, semiconductor electrode/contact layers and anti-fingerprint (AF) films.
3. Which substrates and coating materials are listed?
Substrates include glass, quartz, silicon wafers and ceramics. Coating materials include silicon dioxide, titanium dioxide, zirconium dioxide and silicon monoxide.
4. How does OPT-E control multilayer deposition?
OPT-E uses crystal and optical monitoring for film thickness and optical wavelength control during multilayer deposition.
5. Which ion-source configurations are listed?
The listed configurations are RF, hollow cathode and filament Hall ion sources. These are configuration choices rather than a statement that all three are installed together.
6. What chamber sizes and working temperature are listed?
Chamber diameters are Φ900, Φ1100, Φ1350, Φ1550, Φ1800, Φ2050, Φ2350 and Φ2700 mm, with a listed chamber height of 1500 mm. Working temperature is adjustable from room temperature to 300°C.
7. What workpiece carrier configurations are listed?
The listed carrier configurations are an integrated dome or a 4-axis planetary disc. Carrier motion uses revolution or planetary rotation with variable-frequency stepless speed regulation.