HD500-Brand-new Composite Ion Coating Equipment of HD Series
Unique Lateral Etching
√ Outstanding uniformity in lateral etching
√ Excellent etching overhang property and convenient maintenance
Composite HiPIMS Magnetron Sputtering
√ Equipped with DC + HiPIMS MS sources, it ensures high deposition rates while meeting the energy requirements for depositing refractory metals such as Nb, BC, W, V, etc., and is capable of depositing almost all materials.
Plasma-optimized Multi-arc Source
√ Equipped with 3 groups of 6 circular multi-arc target sources, the concealed arc initiation mechanism is reliable and easy to maintain.
√ It can easily achieve multi-element and multi-layer thin film deposition.
√ The optimized plasma multi-arc source ensures a smoother thin film surface.
√ The target material utilization rate is extremely high.
Multiple Deposition Technology Platforms
√ Realize multiple thin film deposition technologies on the same platform, including DC MS + HiPIMS MS + multi-arc ion plating, and can implement single, composite, and mixed coating methods in the same batch.
| Name | Parameter |
| Coating technology | Brand-new composite coating technology |
| Etching | Lateral ion source (hot filament) |
| Multi-arc sources (number) | 6 |
| Magnetron cathodes (number) | 1 |
| Equipment size (mm) | length3400*width1600*height2600 |
| Chamber volume (m³) | 0.7 |
| Effective coating area (mm) | Ф410*400 |
| Maximum working temperature (℃) | 700 |
| Loading capacity (number of trees) | 5 |
| Blade loading (APMT1135) | 6000pcs |
| Rod blade loading capacity (D4*50L) | 1800pcs |
| Maximum loading weight (KG) | 300 |
| Shaft diameter | Ф130 |
| Process time | AlTiN:6~8h |


HD500
AC