Coating Progress

Load the sample system into the coating chamber.

When depositing PVD coatings, high vacuum is required. Huasheng's coating system proceeds in two steps: First, the mechanical pump reduces the vacuum chamber pressure from 1000mbar to 10-1mbar; Then, the turbo molecular pump generates a high vacuum of about 1X10-6m bar.

Heat the chamber to around 500℃,  which is the conventional process temperature.

Huasheng's coating system uses three different etching process technologies: HUASHENG® (lateral glow discharge); Argon plasma etching, glow discharge; Metal ion etching (Ti+, Cr +).

Coating deposition is achieved using PVD(arc ion plating, magnetron sputtering or integrated cathode HUASHENG®technology).

Cool the coating chamber.

Unload the sample system from the coating chamber.