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Coating Progress

Typical PVD coating process (7steps)

01

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Load the sample system into the coating chamber.
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02

Vacuum pumping

When depositing PVD coatings, high vacuum is required. Huasheng's coating system proceeds in two steps: First, the mechanical pump reduces the vacuum chamber pressure from 1000mbar to 10-1mbar; Then, the turbo molecular pump generates a high vacuum of about 1X10-6m bar.
Vacuum pumping
03

Heating

Heat the chamber to around 500℃,  which is the conventional process temperature.
Heating
04

Plasma etching

Huasheng's coating system uses three different etching process technologies: HUASHENG® (lateral glow discharge); Argon plasma etching, glow discharge; Metal ion etching (Ti+, Cr +).
Cooling
05

Deposition

Coating deposition is achieved using PVD(arc ion plating, magnetron sputtering or integrated cathode HUASHENG®technology).
Heating
06

Cooling

Cool the coating chamber.
Vacuum pumping
07

Unloading

Unload the sample system from the coating chamber.
Unloading
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Process 1

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Process 2

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Process 3

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Process 4

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Process 5

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Process 6

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Process 7